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Membrane Science and Technology

Frontiers in Membrane Science and Technology ·

Volume 4 - 2025 | https://doi.org/10.3389/frmst.2025.1647886

Correction: Modeling pore wetting in direct contact membrane distillation—effect of interfacial capillary pressure

  • S. N. A. Ahmad1
  • Takeshi Matsuura1,2
  • Juhana Jaafar1*corresponding author
  • L. Y. Jiang3
  • A. F. Ismail1
  • M. H. D. Othman1
  • Mukhlis A. Rahman1
  1. 11 Advanced Membrane Technology Research Centre (AMTEC), Faculty of Chemical and Energy Engineering, Universiti Teknologi Malaysia, Johor Bahru, Johor, Malaysia
  2. 22 Department of Chemical and Biological Engineering, University of Ottawa, Ottawa, ON, Canada
  3. 33 School of Metallurgy and Environment, Central South University, Changsha, Hunan, China
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Abstract

Keywords

The funder Hunan Provincial Department of Education, China, (22A0003) to “LJ” was erroneously omitted. The correct Funding statement reads.

Publisher’s note

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Statements

Funding

The author(s) declare that financial support was received for the research and/or publication of this article. From the Ministry of Higher Education, Malaysia under HICoE grant, R.J090301.7851.4J433, Universiti Teknologi Malaysia under Hi-Tech (F4) grant Q.J130000.4609.00Q14, and from Hunan Provincial Department of Education, China, (22A0003) to LJ.

In the Acknowledgements, Financial support from Hunan Provincial Department of Education, China under 22A0003 was not mentioned. The correct Acknowledgments reads:

The authors would like to express gratitude to the Ministry of Higher Education, Malaysia for funding under HICoE grant, R.J090301.7851.4J433, to Universiti Teknologi Malaysia for the financial funding under Hi-Tech (F4) grant Q.J130000.4609.00Q14, and Hunan Provincial Department of Education, China under 22A0003.

The original article has been updated.

Citation

Ahmad, S. N. A., et al. (2025). Correction: Modeling pore wetting in direct contact membrane distillation—effect of interfacial capillary pressure. Frontiers in Membrane Science and Technology, Volume 4. https://doi.org/
Received
Accepted
Published
Volume
4 - 2025

Copyright

Copyright © 2025 Ahmad, Matsuura, Jaafar, Jiang, Ismail, Othman and Rahman.

License: http://creativecommons.org/licenses/by/4.0/

*Correspondence: Juhana Jaafar

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